Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Industries

Power & Utilities

Product Type

Other Finished Goods

Balston Filter product photo

Balston Filter

Product ID: 20035DX
Unit of Measure
10/EA
Min Order Qty
10
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AIRGUARD FILTER 16X20X2

Product ID: AGMX40STD2201
Unit of Measure
12/EA
Min Order Qty
12
PAPER FILTER product photo

PAPER FILTER

Product ID: 3217332K910
Unit of Measure
2/EA
Min Order Qty
2
CRTG R29P700 product photo

CRTG R29P700

Product ID: R29P700
Unit of Measure
1/EA
Min Order Qty
1

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Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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