Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Product Type

Backwash Filters

HGCOLDSG 5-30U-1X  400 product photo

HGCOLDSG 5-30U-1X 400

Product ID: HGCOLDSG530U1X400
Unit of Measure
12/EA
Min Order Qty
12

This product is currently not available. Please contact us for more information.

HGCR-UDX 20-10  400 product photo

HGCR-UDX 20-10 400

Product ID: HGCRUDX2010400
Unit of Measure
36/EA
Min Order Qty
36
HGCR-UDX 1-30 400 product photo

HGCR-UDX 1-30 400

Product ID: HGCRUDX130400
Unit of Measure
12/EA
Min Order Qty
12
HGCR-UDX 1-36-P-E-M8 product photo

HGCR-UDX 1-36-P-E-M8

Product ID: HGCRUDX136PEM8
Unit of Measure
12/EA
Min Order Qty
12
HGPPB-1-50-P-E-M8TVO product photo

HGPPB-1-50-P-E-M8TVO

Product ID: HGPPB150PEM8TVO
Unit of Measure
1/EA
Min Order Qty
1
HGPPT 6-30-P-E-M8 product photo

HGPPT 6-30-P-E-M8

Product ID: HGPPT630PEM8
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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