Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Product Type

Filter Cartridges

RT250A10S product photo

RT250A10S

Product ID: RT250A10S
Unit of Measure
30/EA
Min Order Qty
30
Packaging
Bulk
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HC8800FKT8H

Product ID: HC8800FKT8H
Unit of Measure
6/EA
Min Order Qty
6

Ultipor® III Filter Element

Product ID: HC8900FKT8Z
Unit of Measure
6/EA
Min Order Qty
6

HC9404FMZ8H

Product ID: HC9404FMZ8H
Unit of Measure
1/EA
Min Order Qty
1

HC9801FDN4H

Product ID: HC9801FDN4H
Unit of Measure
1/EA
Min Order Qty
1

ELEMENT "T"RANGE G200KD4Z

Product ID: HCG200FKD4Z
Unit of Measure
1/EA
Min Order Qty
1

ELEMENT "T"RANGE G200KT8Z

Product ID: HCG200FKT8Z
Unit of Measure
1/EA
Min Order Qty
1
PERMI-L 7.68-U-VENT-P product photo

PERMI-L 7.68-U-VENT-P

Product ID: PERMIL768UVENTP
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
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PERMI-L 70-U-A-S product photo

PERMI-L 70-U-A-S

Product ID: PERMIL70UAS
Unit of Measure
12/EA
Min Order Qty
12
Packaging
Bulk
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PERMI-L 70-RT-A-S 569 product photo

PERMI-L 70-RT-A-S 569

Product ID: PERMIL70RTAS569
Unit of Measure
110/EA
Min Order Qty
110
Packaging
Bulk
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PERMI-L SM VENT FILTER product photo

PERMI-L SM VENT FILTER

Product ID: PERMILSMVENTFILTER
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
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PF 0.2-30UE-M26

Product ID: PF0230UEM26
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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