Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Product Type

Filter Cartridges

Product Use

Liquid / Gas / Steam filtration

UAYN2570D010UKKL product photo

Septra Filter Element UAYN2570D010UKKL

Product ID: UAYN2570D010UKKL
Unit of Measure
1/EA
Min Order Qty
1
UPYN2570D010UJ product photo

Septra Filter Element UPYN2570D010UJ

Product ID: UPYN2570D010UJ
Unit of Measure
1/EA
Min Order Qty
1
URSN2540F010EH product photo

Septra Filter Element URSN2540F010EH

Product ID: URSN2540F010EH
Unit of Measure
1/EA
Min Order Qty
1
URYD2570D010HJ product photo

Septra Filter Element URYN2560D010HJ

Product ID: URYD2570D010HJ
Unit of Measure
1/EA
Min Order Qty
1
URYN2570K014LH product photo

Septra Filter Element URYN2570K014LH

Product ID: URYN2570K014LH
Unit of Measure
1/EA
Min Order Qty
1
URSN2559Y060YJ product photo

Septra Filter Element URSN2559Y060YJ

Product ID: URSN2559Y060YJ
Unit of Measure
1/EA
Min Order Qty
1
URYD2559D010EJ product photo

Septra Filter Element URYD2559D010EJ

Product ID: URYD2559D010EJ
Unit of Measure
1/EA
Min Order Qty
1
URYN2540K014LJ product photo

Septra Filter Element URYN2540K014LJ

Product ID: URYN2540K014LJ
Unit of Measure
1/EA
Min Order Qty
1
UTYN2510Y060L product photo

Septra Filter Element UTYN2510Y060L

Product ID: UTYN2510Y060L
Unit of Measure
6/EA
Min Order Qty
6
9 Items
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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