Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Product Type

Housings, Vessels, and Assemblies

Product Use

Mechanical Support for SUPRAdisc II modules when Backflush is used

Backflush Support Set-for SUPRAdisc II 16" modules, to be used in WSFZ 16" 4 high housings

Product ID: 20041342
Unit of Measure
1/EA
Min Order Qty
1
Diameter (Imperial)
16 in
Diameter (Metric)
410 mm
Food Contact Compliant
Yes
Hot Water Sanitization
85 °C
Steam Sterilization
121 °C
Support Grid
Polypropylene
See All Attributes
1 Item
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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