Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Indicators and Switches

RC0450CZ089Z product photo

RC0450CZ089Z INDICATOR

Product ID: RC0450CZ089Z
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RC0450CZ090Z product photo

RC0450CZ090Z INDICATOR

Product ID: RC0450CZ090Z
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RC771BZ090ZSS INDICATOR

Product ID: RC771BZ090ZSS
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RC778NZ090ZSS product photo

INDICATOR V 778NZ090ZSS

Product ID: RC778NZ090ZSS
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RC778NZ091ZSS product photo

RC778NZ091ZSS INDICATOR

Product ID: RC778NZ091ZSS
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RC861CJ084JSSYM product photo

INDICATOR 861CJ084JSSYM

Product ID: RC861CJ084JSSYM
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RC861CZ091ZSSYM product photo

RC861CZ091ZSSYM INDICATOR

Product ID: RC861CZ091ZSSYM
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RC861CZ097ZSSYR product photo

RC861CZ097ZSSYR INDICATOR

Product ID: RC861CZ097ZSSYR
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HC0618-35 INDICATOR

Product ID: HC0618-35
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HC0618-11 product photo

HC0618-11 INDICATOR

Product ID: HC0618-11
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Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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