Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Filter Grade

75 µm

Nexis® High Flow Large Format Filters, Removal Rating 75 µm, Length 20 inches

Product ID: HFNX620Y750H13
Unit of Measure
4/EA
Min Order Qty
4
Cartridge Length
20/508 inch/mm
Filter Grade
75 µm
Outside Diameter (Imperial)
6 in
Outside Diameter (Metric)
152.4 mm
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
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Nexis® High Flow Large Format Filters, Removal Rating 75 µm, Length 40 inches

Product ID: HFNX640Y750J
Unit of Measure
4/EA
Min Order Qty
4
Cartridge Length
40/1016 inch/mm
Filter Grade
75 µm
Outside Diameter (Imperial)
6 in
Outside Diameter (Metric)
152.4 mm
Cartridge Length (Imperial)
40 in
Cartridge Length (Metric)
1016 mm
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2 Items
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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