Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Cartridge Length (Imperial)

30 in

Gasket / O-Ring Material

FEP encapsulated fluorocarbon elastomer (O-rings)

Nexis® A Series Filter Cartridges, Removal Rating 20 μm, Polypropylene, Length 30 inches, FEP encapsulated fluorocarbon elastomer Orings product photo

Nexis® A Series Filter Cartridges, Removal Rating 20 μm, Polypropylene, Length 30 inches, FEP encapsulated fluorocarbon elastomer Orings

Product ID: NXA2030UM8F
Unit of Measure
12/EA
Min Order Qty
12
Micron
20 micron
Nexis® T Filter Cartridges, Removal Rating 0.5 μm, Polypropylene, Length 30 inches, FEP encapsulated Fluorocarbon Elastomer Orings product photo

Nexis® T Filter Cartridges, Removal Rating 0.5 μm, Polypropylene, Length 30 inches, FEP encapsulated Fluorocarbon Elastomer Orings

Product ID: NXT0530UM26F
Unit of Measure
24/EA
Min Order Qty
24
Micron
0.5 micron

Nexis® T Filter Cartridges, Removal Rating 30 μm, Polypropylene, Length 30 inches, FEP encapsulated Fluorocarbon Elastomer Orings, SOE fin end external 226 O-rings

Product ID: NXT3030UM7F
Unit of Measure
24/EA
Min Order Qty
24
Removal Rating
30 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket / O-Ring Material
FEP encapsulated fluorocarbon elastomer (O-rings)
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3 Items
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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