Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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O-RING FLCB ORH153 K

Product ID: 1197150
Unit of Measure
1/EA
Min Order Qty
1

1198559,BUNA-N,-40--110

Product ID: 1198559
Unit of Measure
1/EA
Min Order Qty
1

CTRG PROFILE R4F 100 ECO TEC 12684

Product ID: 12684
Unit of Measure
9/EA
Min Order Qty
9

ORING -331 NITRILE 90 DURO

Product ID: 133142490
Unit of Measure
1/EA
Min Order Qty
1

ASSY ANTI-BACKFLOW VLV R619 YS31

Product ID: 1397706
Unit of Measure
1/EA
Min Order Qty
1

O-RING NITL OR-261.5

Product ID: 1398624
Unit of Measure
1/EA
Min Order Qty
1

Vac Pump Gear Oil SYNP150Q

Product ID: 150015001
Unit of Measure
1/EA
Min Order Qty
1

1P30A

Product ID: 1P30A
Unit of Measure
20/EA
Min Order Qty
20

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Supralon™ Lube and Hydraulic Fluid Filter Elements, Removal Rating 12 μm, GlassFiber, Length 8 Inches

Product ID: 266-8337
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 2000
Family
Supralon
Filter Media
Glass Fiber
Filter Removal Rating
12 micron (Beta 2000)
Filter Removal Rating (μm)
12 µm
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ELEMENT, BONDED 105 MICRON product photo

ELEMENT, BONDED 105 MICRON

Product ID: 30596
Unit of Measure
1/EA
Min Order Qty
1

HCG200FCS4Z ELEMENT BRANDED

Product ID: 51657348
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HCG200
Family
Versalon
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
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SUPRApak SW 7000 LW

Product ID: 5302741
Unit of Measure
1/EA
Min Order Qty
1
Core Drainage Discs
Polypropylene
Diameter (Imperial)
16 in
Diameter (Metric)
410 mm
Filter Media
Kieselguhr, Perlite and Cellulose Fibers
Filtration Area (Imperial)
86.1 ft²
Filtration Area (Metric)
8 m²
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1,554 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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