Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Microelectronics

NXT 3-10U-M3F product photo

Nexis, NXT, 3 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), FEP encapsulated fluorocarbon elastomer (O-rings)

Product ID: NXT310UM3F
Unit of Measure
30/EA
Min Order Qty
30
Micron
3 micron

Nexis® T Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 20 inches, DOE Santoprene gasket seal

Product ID: NXT320UH21
Unit of Measure
20/EA
Min Order Qty
20
Removal Rating
3 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
NA
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Nexis® T Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 20 inches, EPDM, DOE with elastomer gasket seals and end caps

Product ID: NXT320UDOEE
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
3 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
EPDM
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Nexis® T Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 29.25 inches

Product ID: NXT32925U
Unit of Measure
20/EA
Min Order Qty
20
Removal Rating
3 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
29.25 in
Cartridge Length (Metric)
743 mm
Cartridge Length (Metric)
74.3 cm
Gasket / O-Ring Material
NA
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NXT 40-20U-M7E product photo

Nexis, NXT, 40 μm, 50.8 cm (20 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXT4020UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
40 micron
NXT 40-10U-M7S product photo

Nexis, NXT, 40 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), Silicone gasket

Product ID: NXT4010UM7S
Unit of Measure
30/EA
Min Order Qty
30
Micron
40 micron

NXT 50-20U-DOES

Product ID: NXT5020UDOES
Unit of Measure
24/EA
Min Order Qty
24
NXT 50-20U-M8E product photo

Nexis, NXT, 50 μm, 50.8 cm (20 in), SOE fin end, external 222 O-rings (retrofits other manufacturers’ Code 5), EPDM gasket

Product ID: NXT5020UM8E
Unit of Measure
12/EA
Min Order Qty
24
Micron
50 micron

Nexis® T Filter Cartridges, Removal Rating 5 μm, Polypropylene, Length 10 inches, FEP encapsulated Fluorocarbon Elastomer Orings, SOE flat closed end external 222 O-rings

Product ID: NXT510UM3F
Unit of Measure
30/EA
Min Order Qty
30
Removal Rating
5 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
Gasket / O-Ring Material
FEP encapsulated fluorocarbon elastomer (O-rings)
See All Attributes
NXT 5-10U-H21 product photo

Nexis, NXT, 5 μm, 25.4 cm (10 in), DOE, Santoprene gasket seal

Product ID: NXT510UH21
Unit of Measure
1/EA
Min Order Qty
1
Micron
5 micron
NXT 5-10U-M3V product photo

Nexis, NXT, 5 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), Fluorocarbon Elastomer gasket

Product ID: NXT510UM3V
Unit of Measure
30/EA
Min Order Qty
30
Micron
5 micron
NXT 5-10U-DOET product photo

Nexis, NXT, 5 μm, 25.4 cm (10 in), DOE with elastomer gasket seals and end caps, Expanded PTFE (gaskets) - DOE option FEP encapsulated silicone (O-rings) - SOE option

Product ID: NXT510UDOET
Unit of Measure
1/EA
Min Order Qty
1
Micron
5 micron
445 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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