Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Microelectronics

ELEM,CART,P , 2.00, 6.00, product photo

ELEM,CART,P , 2.00, 6.00,

Product ID: D118033100J60S
Unit of Measure
1/EA
Min Order Qty
1
CRTG E591F2MS product photo

CRTG E591F2MS

Product ID: E591F2MS
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1/EA
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1
CRTG E591F2QS product photo

CRTG E591F2QS

Product ID: E591F2QS
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1/EA
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1

CHEM-VENT FILT

Product ID: EA91F1MX
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1/EA
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1
CRTG EA92F1MS product photo

CRTG EA92F1MS

Product ID: EA92F1MS
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1/EA
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1
G005AW30S-1PK product photo

G005AW30S-1PK

Product ID: G005AW30S1PK
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1/EA
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1
G0.5AW20S-1PK product photo

G0.5AW20S-1PK

Product ID: G05AW20S1PK
Unit of Measure
1/EA
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1
Packaging
Individually wrapped
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IDL11GN16H product photo

IDL11GN16H

Product ID: IDL11GN16H
Unit of Measure
1/EA
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1

IJFP2D71

Product ID: IJFP2D71TIMONIUM
Unit of Measure
1/EA
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1

IJFM3B71

Product ID: IJFM3B71TIMONIUM
Unit of Measure
1/EA
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1
K10A10U-1PK 430 product photo

K10A10U-1PK 430

Product ID: K10A10U1PK430
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1/EA
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Individually wrapped
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Discontinued

This part is no longer available. Please contact us for more information.
LH1-H product photo

LH1-H

Product ID: LH1H
Unit of Measure
1/EA
Min Order Qty
1
445 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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