Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Industries

Microelectronics

RM2F050H21-COA

Product ID: RM2F050H21COATIMMD
Unit of Measure
1/EA
Min Order Qty
1

RM2F070H21-COA

Product ID: RM2F070H21COATIMMD
Unit of Measure
24/EA
Min Order Qty
48

RM3F050H21

Product ID: RM3F050H21TIMONIUM
Unit of Measure
48/EA
Min Order Qty
48

RM3F300H21

Product ID: RM3F300H21TIMONIUM
Unit of Measure
1/EA
Min Order Qty
1
RT001A10A product photo

RT001A10A

Product ID: RT001A10A
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
SHELL ASSY LMOVS20S product photo

SHELL ASSY LMOVS20S

Product ID: SHELLASSYLMOVS20S
Unit of Measure
1/EA
Min Order Qty
1
CRTG SLK7001BC product photo

CRTG SLK7001BC

Product ID: SLK7001BC
Unit of Measure
1/EA
Min Order Qty
1
T003A10Y product photo

T003A10Y

Product ID: T003A10Y
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
T001BB10Y-M3 product photo

T001BB10Y-M3

Product ID: T001BB10YM3
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
T010BB10Y-M3 product photo

T010BB10Y-M3

Product ID: T010BB10YM3
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
T010BB20Y-M3 product photo

T010BB20Y-M3

Product ID: T010BB20YM3
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
T025A10Y product photo

T025A10Y

Product ID: T025A10Y
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

    Select Language :