Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Industries

Microelectronics

T005BB10Y-M3 product photo

T005BB10Y-M3

Product ID: T005BB10YM3
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
T010A10Y product photo

T010A10Y

Product ID: T010A10Y
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
T025BB10Y-M3 product photo

T025BB10Y-M3

Product ID: T025BB10YM3
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
T025BB30Y-M3 product photo

T025BB30Y-M3

Product ID: T025BB30YM3
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
ORING LMO SHL TEFLON product photo

ORING LMO SHL TEFLON

Product ID: T10520031
Unit of Measure
1/EA
Min Order Qty
1

ORH13-342 ORING LMO SHL BUNA N

Product ID: T10520030
Unit of Measure
10/EA
Min Order Qty
10
U001A10UCE product photo

U001A10UCE

Product ID: U001A10UCE
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
U001A10U product photo

U001A10U

Product ID: U001A10U
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
U001A9.75U product photo

U001A9.75U

Product ID: U001A975U
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
U001A9.75U-1PK product photo

U001A9.75U-1PK

Product ID: U001A975U1PK
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Individually wrapped
See All Attributes
1um, 40", 2.5 OD, Polypropylene Core, Individually wrapped product photo

1um, 40", 2.5 OD, Polypropylene Core, Individually wrapped

Product ID: U001AW40U1PK
Unit of Measure
1/pkg
Min Order Qty
1
Packaging
Individually wrapped
See All Attributes
U003AW29.5A product photo

U003AW29.5A

Product ID: U003AW295A
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
446 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

    Select Language :
    English