Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Microelectronics

R3F120

Product ID: R3F120TIMONIUM
Unit of Measure
24/EA
Min Order Qty
24

R3F200

Product ID: R3F200TIMONIUM
Unit of Measure
24/EA
Min Order Qty
24

R3F700

Product ID: R3F700TIMONIUM
Unit of Measure
48/EA
Min Order Qty
48

R3FYM

Product ID: R3FYMTIMONIUM
Unit of Measure
1/EA
Min Order Qty
1

R4F050

Product ID: R4F050TIMONIUM
Unit of Measure
1/EA
Min Order Qty
1

R4F100

Product ID: R4F100TIMONIUM
Unit of Measure
12/EA
Min Order Qty
12

R4F700

Product ID: R4F700TIMONIUM
Unit of Measure
1/EA
Min Order Qty
1
VP4-3/4-222 product photo

VP4-3/4-222

Product ID: VP434222
Unit of Measure
1/EA
Min Order Qty
1
CRTG CHP10NGFFK product photo

CRTG CHP10NGFFK

Product ID: CHP10NGFFK
Unit of Measure
1/EA
Min Order Qty
1

Discontinued

This part is no longer available. Please contact us for more information.
CRTG CHF92HEFFK product photo

CRTG CHF92HEFFK

Product ID: CHF92HEFFK
Unit of Measure
1/EA
Min Order Qty
1

Discontinued

This part is no longer available. Please contact us for more information.
Claris, Polypropylene, 10 micron, 9.75 inch product photo

Claris, Polypropylene, 10 micron, 9.75 inch

Product ID: CLR10975
Unit of Measure
36/EA
Min Order Qty
36
Length
24.8 cm / 9.75 in
Micron
10 micron

Claris® Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 9.875 inches

Product ID: CLR109875
Unit of Measure
72/EA
Min Order Qty
72
Removal Rating
10 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
9.875 in
Cartridge Length (Metric)
251 mm
Cartridge Length (Metric)
25.1 cm
Gasket / O-Ring Material
NA
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445 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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