Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Microelectronics

Gasket / O-Ring Material

EPDM

NXT 30-10U-M3E product photo

Nexis, NXT, 30 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXT3010UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
30 micron

Nexis® T Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 20 inches, EPDM, DOE with elastomer gasket seals and end caps

Product ID: NXT320UDOEE
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
3 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
EPDM
See All Attributes
NXT 40-20U-M7E product photo

Nexis, NXT, 40 μm, 50.8 cm (20 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXT4020UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
40 micron
NXT 50-20U-M8E product photo

Nexis, NXT, 50 μm, 50.8 cm (20 in), SOE fin end, external 222 O-rings (retrofits other manufacturers’ Code 5), EPDM gasket

Product ID: NXT5020UM8E
Unit of Measure
1/EA
Min Order Qty
1
Micron
50 micron
PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM product photo

PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM

Product ID: PFT0210UEBLK794
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3 product photo

PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3

Product ID: PFT0210UEM3BLK513
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3 product photo

PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3

Product ID: PFT0210UEM3513
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm

Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 30 inches, EPDM

Product ID: CLR130M7E
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
1 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket / O-Ring Material
EPDM
See All Attributes
32 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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