Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Industries

Microelectronics

CLR 75-29.5

Product ID: CLR75295
Unit of Measure
1/EA
Min Order Qty
1
Claris, Polypropylene, 75 micron, 20 inch product photo

75um, 20", DOE

Product ID: CLR7520
Unit of Measure
24/EA
Min Order Qty
24
Length
50.8 cm / 20 in
Micron
75 micron
Claris, Polypropylene, 75 micron, 9.875 inch product photo

Claris, Polypropylene, 75 micron, 9.875 inch

Product ID: CLR759875
Unit of Measure
36/EA
Min Order Qty
36
Length
25.1 cm / 9.875 in
Micron
75 micron

CMC15748

Product ID: CMC15748
Unit of Measure
1/EA
Min Order Qty
1

CMC 10 (6161)

Product ID: CMC106161
Unit of Measure
1/EA
Min Order Qty
1
CSC91HGFFK product photo

CSC91HGFFK

Product ID: CSC91HGFFK
Unit of Measure
1/EA
Min Order Qty
1
CRTG CSP10NGRRL product photo

CRTG CSP10NGRRL

Product ID: CSP10NGRRL
Unit of Measure
1/EA
Min Order Qty
1

Discontinued

This part is no longer available. Please contact us for more information.
ELEM,PACK,P , 1.98 product photo

ELEM,PACK,P , 1.98

Product ID: D010493011005
Unit of Measure
1/EA
Min Order Qty
1
ELEM,CART,P , 2.00, 6.00, product photo

ELEM,CART,P , 2.00, 6.00,

Product ID: D118033100J60S
Unit of Measure
1/EA
Min Order Qty
1

DFA3001J400

Product ID: DFA3001J400
Unit of Measure
1/EA
Min Order Qty
1
DFA Capsule Nylon66 0.1µm product photo

DFA Capsule Nylon66 0.1µm

Product ID: DFA4001NIEY
Unit of Measure
1/EA
Min Order Qty
1

DFN 1-4US-M3

Product ID: DFN14USM3
Unit of Measure
1/EA
Min Order Qty
1
445 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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