Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Nominal Length (Metric)

7.62 cm

UE209AT03Z

Product ID: UE209AT03Z
Unit of Measure
6/EA
Min Order Qty
6
Anti-Static
Yes
Beta Rating
BETA 2000
Element Series
UE209
Family
Athalon
Filter Media
Glass Fiber
Filter Removal Rating
22 micron, Beta 2000
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Athalon Glass Fiber 3 micron (Beta 2000) Fluorocarbon 3in 7.62cm

Product ID: UE209AZ03Z
Unit of Measure
6/EA
Min Order Qty
6
Anti-Static
Yes
Beta Rating
BETA 2000
Element Series
UE209
Family
Athalon
Filter Media
Glass Fiber
Filter Removal Rating (μm)
3 µm
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ELEMENT ULTIPLEAT SRT

Product ID: UE209AS03Z
Unit of Measure
6/EA
Min Order Qty
6
Anti-Static
Yes
Beta Rating
BETA 2000
Element Series
UE209
Family
Athalon
Filter Media
Glass Fiber
Filter Removal Rating
12 micron (Beta 2000)
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Red1000 Glass Fiber 7 micron (Beta 1000) Nitrile 3in 7.62cm (REPLACED BY HC0896FHN3Z)

Product ID: HC0896FDN3H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC0896
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating
7 micron (Beta 1000)
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HC2206FCS3Z ELEMENT

Product ID: HC2206FCS3Z
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2206
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating
12 micron, Beta 1000
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Red1000 Glass Fiber 25 micron (Beta 1000) Nitrile 3in 7.62cm length (REPLACED BY HC0896FHT3Z)

Product ID: HC0896FDT3H
Unit of Measure
1/EA
Min Order Qty
6
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC0896
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating (μm)
15 µm
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Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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