Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Filter Media

Kieselguhr, Perlite and Cellulose Fibers

Product ID: 7007889
Unit of Measure
1/EA
Min Order Qty
1
Adaptor End Configuration
Double Open End, Flat Gasket
1. Recommended Max. Backpressure During Backwash
0.5 bar
Plastic Material
Polypropylene
2. Recommended Max. Backpressure During Backwash
7.25 psid
See All Attributes
Product ID: 7007891
Unit of Measure
1/EA
Min Order Qty
1
Adaptor End Configuration
Double Open End, Flat Gasket
1. Recommended Max. Backpressure During Backwash
0.5 bar
Plastic Material
Polypropylene
2. Recommended Max. Backpressure During Backwash
7.25 psid
See All Attributes
Product ID: 7007931
Unit of Measure
1/EA
Min Order Qty
1
Adaptor End Configuration
Double Open End, Flat Gasket
1. Recommended Max. Backpressure During Backwash
0.5 bar
Plastic Material
Polypropylene
2. Recommended Max. Backpressure During Backwash
7.25 psid
See All Attributes
Product ID: 7007868
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
See All Attributes
Product ID: 7007932
Unit of Measure
1/EA
Min Order Qty
1
Adaptor End Configuration
Double Open End, Flat Gasket
1. Recommended Max. Backpressure During Backwash
0.5 bar
Plastic Material
Polypropylene
2. Recommended Max. Backpressure During Backwash
7.25 psid
See All Attributes
Product ID: 7007870
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
See All Attributes
Product ID: 7007942
Unit of Measure
1/EA
Min Order Qty
1
Adaptor End Configuration
Double Open End, Flat Gasket
1. Recommended Max. Backpressure During Backwash
0.5 bar
Plastic Material
Polypropylene
2. Recommended Max. Backpressure During Backwash
7.25 psid
See All Attributes
Product ID: B01091
Unit of Measure
50/EA
Min Order Qty
50
Filter Media
Kieselguhr, Perlite and Cellulose Fibers
Filter Area (Imperial)
3.95 ft²
Filter Area (Metric)
0.37 m²
Hot Water Sanitization
90 °C
See All Attributes
Product ID: B01092
Unit of Measure
50/EA
Min Order Qty
50
Filter Media
Kieselguhr, Perlite and Cellulose Fibers
Filter Area (Imperial)
3.95 ft²
Filter Area (Metric)
0.37 m²
Hot Water Sanitization
90 °C
See All Attributes
Seitz® K Series Depth Filter Sheets, K 100 600x612 product photo
Product ID: B07567
Unit of Measure
50/EA
Min Order Qty
50
Filter Media
Kieselguhr, Perlite and Cellulose Fibers
Filter Area (Imperial)
3.95 ft²
Filter Area (Metric)
0.37 m²
Hot Water Sanitization
90 °C
See All Attributes
Product ID: B07571
Unit of Measure
100/EA
Min Order Qty
100
Filter Media
Kieselguhr, Perlite and Cellulose Fibers
Filter Area (Imperial)
1.73 ft²
Filter Area (Metric)
0.16 m²
Hot Water Sanitization
90 °C
See All Attributes
Product ID: B08274
Unit of Measure
400/EA
Min Order Qty
400
Filter Media
Kieselguhr, Perlite and Cellulose Fibers
Filter Area (Imperial)
0.42 ft²
Filter Area (Metric)
0.04 m²
Hot Water Sanitization
90 °C
See All Attributes
77 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

    Select Language :
    English