Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Brand

Nexis®

A1449249

Product ID: A1449249
Unit of Measure
30/EA
Min Order Qty
30

A-1555 249

Product ID: A1555249
Unit of Measure
30/EA
Min Order Qty
30

A-9935 249

Product ID: A9935249
Unit of Measure
10/EA
Min Order Qty
10

CMC 10 (6161)

Product ID: CMC106161
Unit of Measure
1/EA
Min Order Qty
1

HGD-U005AW50U-M8-N-R

Product ID: HGDU005AW50UM8NR
Unit of Measure
72/EA
Min Order Qty
72

KMT 10106722 139

Product ID: KMT10106722139
Unit of Measure
30/EA
Min Order Qty
30

Nexis® A Series Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 19.5 inches, DOE industrial (no end caps)

Product ID: NXA3195U
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
3 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
19.5 in
Cartridge Length (Metric)
495 mm
Cartridge Length (Metric)
49.5 cm
Gasket / O-Ring Material
NA
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Nexis® A Series Filter Cartridges, Removal Rating 0.5 μm, Polypropylene

Product ID: NXA051UH21
Unit of Measure
6/EA
Min Order Qty
6
Removal Rating
0.5 µm
Membrane Material
Polypropylene
Gasket / O-Ring Material
NA
End Configuration Code
H21
End Configuration
H21 - DOE, Santoprene gasket seal
Cartridge Type
NXA
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MPNA 40-40N

Product ID: MPNA4040N
Unit of Measure
24/EA
Min Order Qty
24

MPNA 20-20E

Product ID: MPNA2020E
Unit of Measure
24/EA
Min Order Qty
24

MPNA 40-20E

Product ID: MPNA4020E
Unit of Measure
24/EA
Min Order Qty
24

MPNT 150-10N

Product ID: MPNT15010N
Unit of Measure
60/EA
Min Order Qty
60
724 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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