Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Brand

Nexis®

Industries

Microelectronics

NXA 10-10U-M3E

Product ID: NXA1010UM3E
Unit of Measure
48/EA
Min Order Qty
48

NXA 1-20U-M3E

Product ID: NXA120UM3E
Unit of Measure
1/EA
Min Order Qty
1

NXA 1-TFU-DOEE 47

Product ID: NXA1TFUDOEE47
Unit of Measure
1/EA
Min Order Qty
1

NXA 20-TFU-DOEE 47

Product ID: NXA20TFUDOEE47
Unit of Measure
1/EA
Min Order Qty
1

NXA 3-10U-M3E

Product ID: NXA310UM3E
Unit of Measure
30/EA
Min Order Qty
30
NXT 0.5-10U-M7E product photo

Nexis, NXT, 0.5 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXT0510UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
NXT 0.5-20U product photo

Nexis, NXT, 0.5 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT0520U
Unit of Measure
1/pkg
Min Order Qty
1
Micron
0.5 micron

NXT 100-20U-M3E

Product ID: NXT10020UM3E
Unit of Measure
1/EA
Min Order Qty
1
NXT 100-30U-M7E product photo

Nexis, NXT, 100 μm, 76.2 cm (30 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXT10030UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
100 micron
NXT 10-10U-M3F product photo

Nexis, NXT, 10 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), FEP encapsulated fluorocarbon elastomer (O-rings)

Product ID: NXT1010UM3F
Unit of Measure
1/EA
Min Order Qty
1
Micron
10 micron

NXT 10-29.25U-H21

Product ID: NXT102925UH21
Unit of Measure
1/EA
Min Order Qty
1
NXT 10-40U-M8N product photo

Nexis, NXT, 10 μm, 102 cm (40 in), SOE fin end, external 222 O-rings (retrofits other manufacturers’ Code 5), Nitrile gasket

Product ID: NXT1040UM8N
Unit of Measure
1/EA
Min Order Qty
1
Micron
10 micron
56 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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