Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Brand

Poly-Fine®

Cartridge Length (Metric)

508 mm

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, Nitrile, DOE industrial product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, Nitrile, DOE industrial

Product ID: PFT0220UNB
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, Nitrile product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, Nitrile

Product ID: PFT0220UN
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, EPDM product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, EPDM

Product ID: PFT0220UE
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, EPDM, DOE industrial product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, EPDM, DOE industrial

Product ID: PFT0220UE513
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, EPDM, SOE flat closed end external 222 O-rings product photo
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, Nitrile, DOE industrial Standard packaging product photo
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, Nitrile, SOE fin end external 222 O-rings product photo
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, silicone, SOE fin end external 226 O-rings, No Bubble Test product photo
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, silicone, DOE industrial product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, silicone, DOE industrial

Product ID: PFT0220US
Unit of Measure
12/EA
Min Order Qty
12
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, silicone, SOE fin end external 226 O-rings product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, silicone, SOE fin end external 226 O-rings

Product ID: PFT0220USM7513
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, Expanded PTFE gaskets FEP encapsulated silicone Orings, SOE flat closed end external 222 O-rings product photo
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, silicone, SOE fin end external 222 O-rings product photo
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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