Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Brand

Profile®

LP6F

Product ID: LP6F
Unit of Measure
4/EA
Min Order Qty
4

CTRG PROFILE R4F 100 ECO TEC 12684

Product ID: 12684
Unit of Measure
9/EA
Min Order Qty
9

AB2UY0453H4

Product ID: AB2UY0453H4
Unit of Measure
1/EA
Min Order Qty
1

Filter 10" Profile Star 1µm

Product ID: AB1A0103J
Unit of Measure
6/EA
Min Order Qty
6

Filter 10" Profile Star 5µm

Product ID: AB1A0503J
Unit of Measure
1/EA
Min Order Qty
1

Profile® Star Filter Cartridge, AB1A0507WH4

Product ID: AB1A0507WH4
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
5 µm
Membrane Material
Polypropylene
Filter Cartridge Style
Code 7
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
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AB1UY0457J

Product ID: AB1UY0457J
Unit of Measure
1/EA
Min Order Qty
1

AB1UY1007H1

Product ID: AB1UY1007H1
Unit of Measure
1/EA
Min Order Qty
1

Profile® UP Filter Cartridges, 10 in, 10µm, Silicone Elastomer

Product ID: AB1UY1007WH4
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
10 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
Gasket / O-Ring Material
Silicone Elastomer
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AB1W00325J

Product ID: AB1W00325J
Unit of Measure
1/EA
Min Order Qty
1

AB1Y0503J

Product ID: AB1Y0503JTIMONIUM
Unit of Measure
1/EA
Min Order Qty
1

AB2P01019J

Product ID: AB2P01019JTIMONIUM
Unit of Measure
1/EA
Min Order Qty
1
637 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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