Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Brand

Profile®

RGN N100 35" SPECIAL LENGTH

Product ID: WR35A720J0
Unit of Measure
12/EA
Min Order Qty
12

MCY1001W003J 254

Product ID: MCY1001W003J254
Unit of Measure
1/EA
Min Order Qty
1

ME3310CPN40H

Product ID: ME3310CPN40H
Unit of Measure
1/EA
Min Order Qty
1

Discontinued

This part is no longer available. Please contact us for more information.

ME3310CPS30H

Product ID: ME3310CPS30H
Unit of Measure
1/EA
Min Order Qty
1

Discontinued

This part is no longer available. Please contact us for more information.

ME3310CPT30H

Product ID: ME3310CPT30H
Unit of Measure
1/EA
Min Order Qty
1

ME3310CPT40H

Product ID: ME3310CPT40H
Unit of Measure
1/EA
Min Order Qty
1

CRTG R19F300

Product ID: R19F300
Unit of Measure
24/EA
Min Order Qty
24

RF-Style 19" Profile II 40µm

Product ID: R19F400
Unit of Measure
24/EA
Min Order Qty
24

Profile® II, Filter Cartridges, Polypropylene, Length 30 Inches

Product ID: RM3F030H21
Unit of Measure
24/EA
Min Order Qty
24
Removal Rating
3 µm
Membrane Material
Polypropylene
Filter Cartridge Style
RMF-style
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
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20" Profile® II Nylon Filter Cartridge

Product ID: HC3310FGP20Z
Unit of Measure
12/EA
Min Order Qty
24

RF-Style 20" Profile Nylon 20µm

Product ID: RGY2FN200
Unit of Measure
12/EA
Min Order Qty
12

CTRG PRFL HARD NYLON

Product ID: WK16B07HKBND
Unit of Measure
320/EA
Min Order Qty
320
637 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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