Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Brand

Water-Fine

Industries

Microelectronics

WFN 0.05-10UV-M3 314

Product ID: WFN00510UVM3314
Unit of Measure
1/EA
Min Order Qty
1

Discontinued

This part is no longer available. Please contact us for more information.

0.2 µm, 10" Double Open Ended (DOE) with EPDM Seals

Product ID: WFN0210UE300
Unit of Measure
1/EA
Min Order Qty
1

0.2 µm, 10" Single Open Ended (Code 7) with Silicone Seals

Product ID: WFN0210USM7300
Unit of Measure
1/EA
Min Order Qty
1

0.2 µm, 20" Double Open Ended (DOE) with Silicone Seals

Product ID: WFN0220US300
Unit of Measure
1/EA
Min Order Qty
1

0.2 µm, 20" Single Open Ended (Code 7) with Silicone Seals

Product ID: WFN0220USM7300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-10US-M7 300

Product ID: WFN04510USM7300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-10US 300

Product ID: WFN04510US300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-10US-M20 300

Product ID: WFN04510USM20300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-20UN 300

Product ID: WFN04520UN300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-30UE 300

Product ID: WFN04530UE300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-30US-M7 300

Product ID: WFN04530USM7300
Unit of Measure
1/EA
Min Order Qty
1

WFN 1.2-9.75UF-M10 300

Product ID: WFN12975UFM10300
Unit of Measure
1/EA
Min Order Qty
1
12 Items
  • 1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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