Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Red1000 Glass Fiber 12 micron (Beta 1000) Nitrile 36in 91.44cm

Product ID: HC2296FKS36H
Unit of Measure
1/EA
Min Order Qty
6
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2296
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
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Ultipor III Glass Fiber 5 micron (Beta 1000) Nitrile 8in 20.32cm length

Product ID: HC9601FDP8H#28
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC9601
Family
Ultipor III
Filter Media
Glass Fiber
Filter Removal Rating (μm)
5 µm
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RT250A10S product photo

RT250A10S

Product ID: RT250A10S
Unit of Measure
30/EA
Min Order Qty
30
Packaging
Bulk
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HS 9000 400x400 OL in cartons

Product ID: 1439025
Unit of Measure
1/EA
Min Order Qty
100
Filter Media
Kieselguhr, Perlite and Cellulose Fibers
Filter Area (Imperial)
1.73 ft²
Filter Area (Metric)
0.16 m²
Hot Water Sanitization
90 °C
Recommended max.dp
3 bar
Size (Imperial)
15.8 x 15.8 in
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Seitz® HS 6000 Series Depth Filter Sheets 400 x 400

Product ID: 1436040
Unit of Measure
100/EA
Min Order Qty
100
Filter Media
Kieselguhr, Perlite and Cellulose Fibers
Filter Area (Imperial)
1.73 ft²
Filter Area (Metric)
0.16 m²
Hot Water Sanitization
90 °C
Recommended max.dp
3 bar
Size (Imperial)
15.8 x 15.8 in
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FILTER DISC, .245 DIA., 17 MIC product photo

FILTER DISC, .245 DIA., 17 MIC

Product ID: 2002024517
Unit of Measure
1/EA
Min Order Qty
1

AquaSep EL L/L Coalescer, 6in length, 2.75in diameter, ≤15ppm separation level, 24μm Beta 50 solids removal rating

Product ID: LCS06ELBH
Unit of Measure
4/EA
Min Order Qty
4
Maximum Operating Temperature (F)
140 °F
Maximum Operating Temperature (C)
60 °C
Change out pressure drop (bar)
1.03 bar
Change out pressure drop (psid)
15 psid
Maximum differential pressure rating (bar)
3.5 bar
Maximum differential pressure rating (psid)
50 psid
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LCMEH

Product ID: LCMEH
Unit of Measure
1/EA
Min Order Qty
1

AquaSep Plus L/L Coalescer, 6in length, 2.75in diameter, ≤15ppm separation level, 1μm Beta 200 solids removal rating

Product ID: LCS06B1AH
Unit of Measure
1/EA
Min Order Qty
1
Maximum Operating Temperature (F)
150 °F
Maximum Operating Temperature (C)
66 °C
Change out pressure drop (bar)
1.03 bar
Change out pressure drop (psid)
15 psid
Maximum differential pressure rating (bar)
3.5 bar
Maximum differential pressure rating (psid)
50 psid
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AquaSep XS L/L Coalescer, 6in length, 2.75in diameter, ≤15ppm separation level, 11μm Beta 5000 solids removal rating

Product ID: LCS06PXSH
Unit of Measure
1/EA
Min Order Qty
1
Maximum Operating Temperature (F)
140 °F
Maximum Operating Temperature (C)
60 °C
Change out pressure drop (bar)
1.03 bar
Change out pressure drop (psid)
15 psid
Maximum differential pressure rating (bar)
3.5 bar
Maximum differential pressure rating (psid)
50 psid
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PhaseSep L/L Coalescer, 20in length, 3.75in diameter, ≤15ppm separation level

Product ID: LCS2H1AH316
Unit of Measure
1/EA
Min Order Qty
1
Coalescer Length (Imperial)
20 in
Coalescer Length (Metric)
50.8 cm

PhaseSep L/L Coalescer, 6in length, 2.75in diameter, ≤15ppm separation level

Product ID: LCS06H1HH
Unit of Measure
1/EA
Min Order Qty
1
Maximum Operating Temperature (F)
300 °F
Maximum Operating Temperature (C)
149 °C
Change out pressure drop (bar)
1.03 bar
Change out pressure drop (psid)
15 psid
Maximum differential pressure rating (bar)
3.5 bar
Maximum differential pressure rating (psid)
50 psid
See All Attributes

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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