Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Red1000 Glass Fiber 12 micron (Beta 1000) Nitrile 36in 91.44cm

Product ID: HC2296FKS36H
Unit of Measure
1/EA
Min Order Qty
6
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2296
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
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This product is currently not available. Please contact us for more information.

RT250A10S product photo

RT250A10S

Product ID: RT250A10S
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
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WCG150-30-U6-40ZJ-106-K10

Product ID: WCG15030U640S00001
Unit of Measure
1/EA
Min Order Qty
1

WCN150HFU618UY020JU

Product ID: WCN150HFU618S00001
Unit of Measure
4/EA
Min Order Qty
4

WCG150-30-U001ZJ-106-K10

Product ID: WCG15030U001S00001
Unit of Measure
1/EA
Min Order Qty
1

WCG150-30-U6-40ZJ

Product ID: WCG15030U640ZJ
Unit of Measure
1/EA
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1

WCG300-30-U6-40ZJ-K10

Product ID: WCG30030U640ZJK10
Unit of Measure
1/EA
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1

WCN150HFU618J010JU

Product ID: WCN150HFU618J010JU
Unit of Measure
1/EA
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1

WCN150-20-U2-20ZJ

Product ID: WCN15020U220ZJ
Unit of Measure
1/EA
Min Order Qty
1

WCG300-30-U010ZJ-K10

Product ID: WCG30030U010ZJK10
Unit of Measure
1/EA
Min Order Qty
1

WCN80-20U001ZJ-MOD-G

Product ID: WCN8020U001ZJMODG
Unit of Measure
1/EA
Min Order Qty
1

WCN80-20-U2-20ZJ

Product ID: WCN8020U220ZJ
Unit of Measure
1/EA
Min Order Qty
1

Discontinued

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Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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