Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Red1000 Glass Fiber 12 micron (Beta 1000) Nitrile 36in 91.44cm

Product ID: HC2296FKS36H
Unit of Measure
1/EA
Min Order Qty
6
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2296
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
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Ultipor III Glass Fiber 5 micron (Beta 1000) Nitrile 8in 20.32cm length

Product ID: HC9601FDP8H#28
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC9601
Family
Ultipor III
Filter Media
Glass Fiber
Filter Removal Rating (μm)
5 µm
See All Attributes
RT250A10S product photo

RT250A10S

Product ID: RT250A10S
Unit of Measure
30/EA
Min Order Qty
30
Packaging
Bulk
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MDY1002ECH

Product ID: MDY1002ECH
Unit of Measure
6/EA
Min Order Qty
6

MDY1002ECH13

Product ID: MDY1002ECH13
Unit of Measure
6/EA
Min Order Qty
6

MDY1002EEH13

Product ID: MDY1002EEH13
Unit of Measure
6/EA
Min Order Qty
6
MDY1002J012H13 product photo

MDY1002J012H13

Product ID: MDY1002J012H13
Unit of Measure
1/EA
Min Order Qty
1

MDY1002J006H13

Product ID: MDY1002J006H13
Unit of Measure
1/EA
Min Order Qty
1

MDY1002FREH2

Product ID: MDY1002FREH2
Unit of Measure
1/EA
Min Order Qty
1

MDY1002J025H13

Product ID: MDY1002J025H13
Unit of Measure
1/EA
Min Order Qty
1

MDY1002J045H2

Product ID: MDY1002J045H2
Unit of Measure
1/EA
Min Order Qty
1

MDY1003DGH13

Product ID: MDY1003DGH13
Unit of Measure
1/EA
Min Order Qty
1
9,822 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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