Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Red1000 Glass Fiber 12 micron (Beta 1000) Nitrile 36in 91.44cm

Product ID: HC2296FKS36H
Unit of Measure
1/EA
Min Order Qty
6
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2296
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
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Ultipor III Glass Fiber 5 micron (Beta 1000) Nitrile 8in 20.32cm length

Product ID: HC9601FDP8H#28
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC9601
Family
Ultipor III
Filter Media
Glass Fiber
Filter Removal Rating (μm)
5 µm
See All Attributes
RT250A10S product photo

RT250A10S

Product ID: RT250A10S
Unit of Measure
30/EA
Min Order Qty
30
Packaging
Bulk
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ORH13-906

Product ID: P1174736
Unit of Measure
1/EA
Min Order Qty
1

ORH13-390

Product ID: P1195870
Unit of Measure
1/EA
Min Order Qty
1

PMM,M020,316L 11.75X48

Product ID: P2015264
Unit of Measure
1/IN2
Min Order Qty
1

LBL1012-D63

Product ID: P2015447
Unit of Measure
1/EA
Min Order Qty
5

ORH1-335

Product ID: P2018262
Unit of Measure
1/EA
Min Order Qty
1

Discontinued

This part is no longer available. Please contact us for more information.

PMM,M020,316L 16X60

Product ID: P2019142
Unit of Measure
1/IN2
Min Order Qty
1

MC3000-187M

Product ID: P2021609
Unit of Measure
1/EA
Min Order Qty
1

ORJ-344

Product ID: P2022218
Unit of Measure
1/EA
Min Order Qty
1

SA7017-075 LC

Product ID: P2029264
Unit of Measure
1/EA
Min Order Qty
1
9,848 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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