Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Food & Beverage

5µm (nominal) CB Micro-Carbon™ II Series filter, 10", DOE with gaskets

Product ID: C10PCB5
Unit of Measure
12/EA
Min Order Qty
12

Micro-Carbon™ II Series Filter 20 in, 5 µm

Product ID: C20PPHP
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
5 µm
Membrane Material
Outer shell - Porous, high density polyethylene (70 µm nominal)
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
Hercuprene
See All Attributes

5µm (nominal) CB Micro-Carbon™ II Series filter, 20", DOE with gaskets

Product ID: C20PCB5
Unit of Measure
6/EA
Min Order Qty
6

Micro-Carbon™ II Series Filter 30 in 5 µm

Product ID: C30PPHP
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
5 µm
Membrane Material
Outer shell - Porous, high density polyethylene (70 µm nominal)
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket / O-Ring Material
Hercuprene
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C9.75P-CB5

Product ID: C975PCB5
Unit of Measure
12/EA
Min Order Qty
12

C9.75P-PHP

Product ID: C975PPHP
Unit of Measure
20/EA
Min Order Qty
20

ORSI ORH4W-226

Product ID: ORH4W-226
Unit of Measure
1/EA
Min Order Qty
1

O-RING SIL 8602 ISO 3601-242

Product ID: ORH4PW-242
Unit of Measure
1/EA
Min Order Qty
1

CENTER POST 3 MODULE

Product ID: PDC20027
Unit of Measure
1/EA
Min Order Qty
1

CENTERPOST 1 MODULE

Product ID: PDC20025
Unit of Measure
1/EA
Min Order Qty
1

KIT - PDC80022P

Product ID: PDC80022P
Unit of Measure
1/EA
Min Order Qty
1

KIT PDC80020S

Product ID: PDC80020S
Unit of Measure
1/EA
Min Order Qty
1
409 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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