Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Food & Beverage

Filter Media

Cellulose Fibers

Seitz® ZD Series Depth Filter Sheets, EK ZD 1003x1014

Product ID: 5303904
Unit of Measure
75/EA
Min Order Qty
75
Filter Media
Cellulose Fibers
Hot Water Sanitization
85 °C
Recommended max.dp
3 bar
Size (Metric)
1003x1014
Food Contact Compliant
Yes

Seitz® ZD Series Depth Filter Sheets, Seitz-K 100 ZD 400x400

Product ID: 5307573
Unit of Measure
100/EA
Min Order Qty
100
Filter Media
Cellulose Fibers
Filter Area (Imperial)
1.73 ft²
Filter Area (Metric)
0.16 m²
Hot Water Sanitization
85 °C
Recommended max.dp
3 bar
Size (Imperial)
15.8 x 15.8 in
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Seitz® ZD Series Depth Filter Sheets, Seitz-EK ZD 400x400

Product ID: 5307570
Unit of Measure
100/EA
Min Order Qty
100
Filter Media
Cellulose Fibers
Filter Area (Imperial)
1.73 ft²
Filter Area (Metric)
0.16 m²
Hot Water Sanitization
85 °C
Recommended max.dp
1.5 bar
Size (Imperial)
15.8 x 15.8 in
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Seitz® D-400 Support Depth Filter Sheets, Seitz D-400 400x800 ME UF/K

Product ID: 692228
Unit of Measure
50/EA
Min Order Qty
50
Filter Media
Cellulose Fibers
Filter Area (Imperial)
3.42 ft²
Filter Area (Metric)
0.32 m²
Size (Imperial)
15.7 x 31.4 in
Size (Metric)
400 x 800 mm
Food Contact Compliant
Yes
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SUPRAdisc SD II EKS 200XEKSC440SPW

Product ID: 7007957
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
Diameter (Imperial)
16 in
Diameter (Metric)
410 mm
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5 Items
  • 1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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