Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industrial Manufacturing

Stainless steel, 10", 1" NPT, EPR seal for DOE cartridge (without gasket)

Product ID: IDLD1GN16J
Unit of Measure
1/EA
Min Order Qty
1

PSS® Plus Series Junior Style Metal Elements, MCS4463PAHJ7BOX

Product ID: MCS4463PAHJ7BOX
Unit of Measure
1/EA
Min Order Qty
1
Filter Media
316 L Stainless Steel
Gasket Seal
Ethylene Propylene Steam Service
Maximum Differential Pressure
5.1 bard (73 psid) to 93.3 °C (200 °F)
Nominal Length (Imperial)
5.2 in
Recommended Maximum Flow Density
11 LPM/5.2
Removal Efficiency
99.9 %
See All Attributes
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 30 Inches, Fluorocarbon Elastomer, product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 30 Inches, Fluorocarbon Elastomer,

Product ID: PFT0230UVSI
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.8 μm, Polypropylene, Length 20 Inches, silicone, DOE industrial, No Bubble Test product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.8 μm, Polypropylene, Length 20 Inches, silicone, DOE industrial, No Bubble Test

Product ID: PFT0820US
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.8 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.8 μm, Polypropylene, Length 30 Inches, FEP encapsulated Fluorocarbon Elastomer Orings product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.8 μm, Polypropylene, Length 30 Inches, FEP encapsulated Fluorocarbon Elastomer Orings

Product ID: PFT0830UFM7
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.8 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 30 Inches, EPDM, SOE fin end external 226 O-rings, No Bubble Test product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 30 Inches, EPDM, SOE fin end external 226 O-rings, No Bubble Test

Product ID: PFT1030UEM7
Unit of Measure
1/EA
Min Order Qty
1
Micron
10 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 2 μm, Polypropylene, Length 20 Inches, EPDM, DOE industrial, No Bubble Test product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 2 μm, Polypropylene, Length 20 Inches, EPDM, DOE industrial, No Bubble Test

Product ID: PFT220UE
Unit of Measure
1/EA
Min Order Qty
1
Micron
2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 20 Inches, Nitrile product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 20 Inches, Nitrile

Product ID: PFT320UN
Unit of Measure
1/EA
Min Order Qty
1
Micron
3 µm

Marksman™, Large Format Filters, Filter Grade 20 µm, polypropylene, Size 2 bag, No flange

Product ID: PFTM202UNF
Unit of Measure
1/EA
Min Order Qty
1

ORH-242 O-RING VITON-A

Product ID: T10540807
Unit of Measure
1/EA
Min Order Qty
1

Marksman™, Large Format Filters, Filter Grade 1.5 µm, Polypropylene, Size 2 bag, EPDM, Plastic self-adjusting flange

Product ID: XLDM152UEPFA
Unit of Measure
1/EA
Min Order Qty
1

Marksman™, Large Format Filters, Filter Grade 3 µm, Polypropylene, Size 2 bag, EPDM

Product ID: XLDM32UEPFA
Unit of Measure
1/EA
Min Order Qty
1
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Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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