Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industrial Manufacturing

Red1000 Glass Fiber 12 micron (Beta 1000) Nitrile 36in 91.44cm

Product ID: HC2296FKS36H
Unit of Measure
1/EA
Min Order Qty
6
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2296
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
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Ultipor III Glass Fiber 5 micron (Beta 1000) Nitrile 8in 20.32cm length

Product ID: HC9601FDP8H#28
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC9601
Family
Ultipor III
Filter Media
Glass Fiber
Filter Removal Rating (μm)
5 µm
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Cartridge, Stringwound, Nylon, 5 um, 30

Product ID: FP FNY5R30A-E
Unit of Measure
15/EA
Min Order Qty
15

RING BK UP -235 PARKER

Product ID: FP390692
Unit of Measure
1/EA
Min Order Qty
1

RING BK UP -130 PARKER

Product ID: FP390691
Unit of Measure
1/EA
Min Order Qty
1

CP721-200-ACNN606V

Product ID: FP91M944AB20
Unit of Measure
1/EA
Min Order Qty
1

STRINGWOUND FILTER

Product ID: FPY5R10S
Unit of Measure
1/EA
Min Order Qty
1

BREATHER FILTER

Product ID: FS05025
Unit of Measure
6/EA
Min Order Qty
6
Filter Test Kit AND 25pack product photo

Filter Test Kit AND 25pack

Product ID: FTKAND
Unit of Measure
1/BOX
Min Order Qty
1

This product is currently not available. Please contact us for more information.

FILTER TEST KIT U200Z 04725 product photo

FILTER TEST KIT U200Z 04725

Product ID: FTKU200Z
Unit of Measure
1/EA
Min Order Qty
1
FILTER TEST KIT U400Z 04725 product photo

FILTER TEST KIT U400Z 04725

Product ID: FTKU400Z
Unit of Measure
1/EA
Min Order Qty
1

UH319SKH

Product ID: FUH319SKH
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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