Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industrial Manufacturing

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Housings, Vessels, and Assemblies

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HOUSING PCY2RFG16HY

Product ID: PCY2RFG16HY
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CCL4001G160H13

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AFV03DJ04HB-CN

Product ID: AFV03DJ04HBCN
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1/EA
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Inlet/Outlet Connections Type
Flange (150 #)
Cartridge Length (Imperial)
40 in
Family
Athalon
Pressure Rating
217 psi
Port Size
4 in
Number of Cartridges
3 per side
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Athalon, 217psi Non-bypass Duplex Hsg, 4in Flange Ports, 40in Length, Nitrile Seals

Product ID: AFV07DJ04HNCN
Unit of Measure
1/EA
Min Order Qty
1
Inlet/Outlet Connections Type
Flange (150 #)
Cartridge Length (Imperial)
40 in
Family
Athalon
Pressure Rating
217 psi
Port Size
4 in
Number of Cartridges
7 per side
See All Attributes

Athalon, 217psi Duplex Hsg, 6in Flange Ports, 40in Length, Nitrile Seals

Product ID: AFV07DJ06HBCN
Unit of Measure
1/EA
Min Order Qty
1
Inlet/Outlet Connections Type
Flange (150 #)
Cartridge Length (Imperial)
40 in
Family
Athalon
Pressure Rating
217 psi
Port Size
6 in
Number of Cartridges
7 per side
See All Attributes

AFV07DJ04HB-CN

Product ID: AFV07DJ04HBCN
Unit of Measure
1/EA
Min Order Qty
1
Inlet/Outlet Connections Type
Flange (150 #)
Cartridge Length (Imperial)
40 in
Family
Athalon
Pressure Rating
217 psi
Port Size
4 in
Number of Cartridges
7 per side
See All Attributes
PPS10UP-3/4-PR -911623 product photo

PPS10UP-3/4-PR -911623

Product ID: PPS10UP34PR
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SCO10U-3/4

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SCO10UP-3/4

Product ID: SCO10UP34
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1/EA
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UNIV SEAT CUP 1.75ID 316L product photo

UNIV SEAT CUP 1.75ID 316L

Product ID: T10575031
Unit of Measure
1/EA
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1
SEAL NUT PTM# P1175655 #MCL1001-4D22 product photo

SEAL NUT PTM# P1175655 #MCL1001-4D22

Product ID: T11078131
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FMOCOVERASSY316L product photo

FMOCOVERASSY316L

Product ID: T20041031
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1/EA
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1
679 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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