Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Microelectronics

Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 40 inches product photo

Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 40 inches

Product ID: CLR140
Unit of Measure
12/EA
Min Order Qty
12
Length
102 cm / 40 in
Micron
1 micron
Claris, Polypropylene, 20 micron, 20 inch product photo

20µm, 20", DOE (no seal)

Product ID: CLR2020
Unit of Measure
24/EA
Min Order Qty
24
Length
50.8 cm / 20 in
Micron
20 micron
U003AW40U-1PK product photo

3um, 40", 2.5 OD, Polypropylene Core, Individually wrapped

Product ID: U003AW40U1PK
Unit of Measure
1/pkg
Min Order Qty
1
Packaging
Individually wrapped
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Filter 10" HDC II 6µm

Product ID: MCY1001J060J
Unit of Measure
24/EA
Min Order Qty
24
U020AW40U-EC1U product photo

U020AW40U-EC1U

Product ID: U020AW40UEC1U
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
U100AW30T-EC1T product photo

U100AW30T-EC1T

Product ID: U100AW30TEC1T
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
6 Items
  • 1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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