Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Microelectronics

FSL315CAP 204 product photo

FSL315CAP 204

Product ID: FSL315CAP204
Unit of Measure
1/EA
Min Order Qty
1
C050A10U product photo

C050A10U

Product ID: C050A10U
Unit of Measure
30/EA
Min Order Qty
30
Packaging
Bulk
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K3A20U-1PK 430 product photo

K3A20U-1PK 430

Product ID: K3A20U1PK430
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
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Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 20 inches, DOE Santoprene gasket seal

Product ID: CLR120H21
Unit of Measure
24/EA
Min Order Qty
24
Removal Rating
1 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
NA
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Claris, Polypropylene, 75 micron, 9.875 inch product photo

Claris, Polypropylene, 75 micron, 9.875 inch

Product ID: CLR759875
Unit of Measure
36/EA
Min Order Qty
36
Length
25.1 cm / 9.875 in
Micron
75 micron

CMC 10 (6161)

Product ID: CMC106161
Unit of Measure
1/EA
Min Order Qty
1

DFA3001J400

Product ID: DFA3001J400
Unit of Measure
1/EA
Min Order Qty
1
DFA Capsule Nylon66 0.1µm product photo

DFA Capsule Nylon66 0.1µm

Product ID: DFA4001NIEY
Unit of Measure
1/EA
Min Order Qty
1
PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3 product photo

PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3

Product ID: PFT0210UEM3513
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm

Filter 10" HDC II 6µm

Product ID: MCY1001J060J
Unit of Measure
24/EA
Min Order Qty
24

MCY1001W003J 254

Product ID: MCY1001W003J254
Unit of Measure
1/EA
Min Order Qty
1

MPF2230F002EH1

Product ID: MPF2230F002EH1
Unit of Measure
1/EA
Min Order Qty
1
445 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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