Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Microelectronics

200P19.5U product photo

200P19.5U

Product ID: 200P195U
Unit of Measure
1/EA
Min Order Qty
1
CRTG CHF92HEFFK product photo

CRTG CHF92HEFFK

Product ID: CHF92HEFFK
Unit of Measure
1/EA
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1

Discontinued

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CRTG CHP10NGFFK product photo

CRTG CHP10NGFFK

Product ID: CHP10NGFFK
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Discontinued

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NXA 5-20U-M3E product photo

Nexis, NXA, 5 μm, 50.8 cm (20 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA520UM3E
Unit of Measure
12/EA
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12
Micron
5 micron
NXA 5-30U-M3E product photo

Nexis, NXA, 5 μm, 76.2 cm (30 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA530UM3E
Unit of Measure
24/EA
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24
Micron
5 micron

49834716

Product ID: 49834716TIMONIUM
Unit of Measure
48/EA
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48

5EC4888389400J

Product ID: 5EC4888389400J
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1/EA
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5EC4888389200J

Product ID: 5EC4888389200J
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1/EA
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C001AW20U product photo

C001AW20U

Product ID: C001AW20U
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1
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C001AW20S

Product ID: C001AW20S
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10/EA
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10
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C025AW19.5A product photo

C025AW19.5A

Product ID: C025AW195A
Unit of Measure
10/EA
Min Order Qty
10
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C030A10U product photo

C030A10U

Product ID: C030A10U
Unit of Measure
30/EA
Min Order Qty
30
445 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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