Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Microelectronics

C001AW20U product photo

C001AW20U

Product ID: C001AW20U
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1/EA
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C001AW20S product photo

C001AW20S

Product ID: C001AW20S
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C025AW19.5A

Product ID: C025AW195A
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C030A10U

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C030AW29.25U

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C030AW20U product photo

C030AW20U

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C050A10U

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C030AW30U

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DFT Classic®, Filter Cartridges, Removal Rating 100 μm, Length 10 Inches, 316 stainless steel, Bulk packaging product photo

DFT Classic®, Filter Cartridges, Removal Rating 100 μm, Length 10 Inches, 316 stainless steel, Bulk packaging

Product ID: C100A10S
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C1A10SC-1PK 397

Product ID: C1A10SC1PK397
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BOWL 10" MEGAPLAST G2 PFA440HP product photo

BOWL 10" MEGAPLAST G2 PFA440HP

Product ID: CC36849D02
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CRTG   CFP04NGFFU product photo

CRTG CFP04NGFFU

Product ID: CFP04NGFFU
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Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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