Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Microelectronics

Cartridge Length (Imperial)

10 in

DFT Classic®, Filter Cartridges, Removal Rating 100 μm, Length 10 Inches, 316 stainless steel, Bulk packaging product photo

DFT Classic®, Filter Cartridges, Removal Rating 100 μm, Length 10 Inches, 316 stainless steel, Bulk packaging

Product ID: C100A10S
Unit of Measure
30/EA
Min Order Qty
30
Packaging
Bulk
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Claris® Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 10 inches

Product ID: CLR310
Unit of Measure
36/EA
Min Order Qty
36
Removal Rating
3 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
Gasket / O-Ring Material
NA
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NXA 0.5-10U-M7S product photo

Nexis, NXA, 0.5 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), Silicone gasket

Product ID: NXA0510UM7S
Unit of Measure
30/EA
Min Order Qty
30
Micron
0.5 micron
NXA 0.5-10U-DOEE product photo

Nexis, NXA, 0.5 μm, 25.4 cm (10 in), DOE with elastomer gasket seals and end caps, EPDM gasket

Product ID: NXA0510UDOEE
Unit of Measure
30/EA
Min Order Qty
30
Micron
0.5 micron
NXA 0.5-10U-M3E product photo

Nexis, NXA, 0.5 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA0510UM3E
Unit of Measure
60/EA
Min Order Qty
60
Micron
0.5 micron
NXA 10-10U product photo

Nexis, NXA, 10 μm, 25.4 cm (10 in), DOE industrial (no end caps)

Product ID: NXA1010U
Unit of Measure
30/EA
Min Order Qty
30
Micron
10 micron
NXA 1-10U-M3S product photo

Nexis, NXA, 1 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), Silicone gasket

Product ID: NXA110UM3S
Unit of Measure
30/EA
Min Order Qty
30
Micron
1 micron
NXA 120-10U-M7E product photo

Nexis, NXA, 120 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXA12010UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
120 micron
NXA 40-10U-M7S product photo

Nexis, NXA, 40 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), Silicone gasket

Product ID: NXA4010UM7S
Unit of Measure
1/EA
Min Order Qty
1
Micron
40 micron
NXA 70-10U-M7S product photo

Nexis, NXA, 70 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), Silicone gasket

Product ID: NXA7010UM7S
Unit of Measure
30/EA
Min Order Qty
30
Micron
70 micron
NXT 0.5-10U-M7E product photo

Nexis, NXT, 0.5 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXT0510UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
NXT 10-10U-M3F product photo

Nexis, NXT, 10 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), FEP encapsulated fluorocarbon elastomer (O-rings)

Product ID: NXT1010UM3F
Unit of Measure
60/EA
Min Order Qty
60
Micron
10 micron
32 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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