Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Industries

Microelectronics

Cartridge Length (Imperial)

10 in

NXA 1-10U-M3S product photo

Nexis, NXA, 1 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), Silicone gasket

Product ID: NXA110UM3S
Unit of Measure
1/EA
Min Order Qty
1
Micron
1 micron
NXA 1-10U-M3E product photo

Nexis, NXA, 1 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA110UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
1 micron
NXA 120-10U-M7E product photo

Nexis, NXA, 120 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXA12010UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
120 micron
NXA 40-10U-M7S product photo

Nexis, NXA, 40 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), Silicone gasket

Product ID: NXA4010UM7S
Unit of Measure
1/EA
Min Order Qty
1
Micron
40 micron
NXA 70-10U-M7S product photo

Nexis, NXA, 70 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), Silicone gasket

Product ID: NXA7010UM7S
Unit of Measure
1/EA
Min Order Qty
1
Micron
70 micron
NXT 0.5-10U-M7E product photo

Nexis, NXT, 0.5 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXT0510UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron

Nexis® T Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 10 inches, DOE Santoprene gasket seal

Product ID: NXT1010UH21
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
10 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
Gasket / O-Ring Material
NA
See All Attributes
NXT 10-10U-M3F product photo

Nexis, NXT, 10 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), FEP encapsulated fluorocarbon elastomer (O-rings)

Product ID: NXT1010UM3F
Unit of Measure
1/EA
Min Order Qty
1
Micron
10 micron
NXT 1-10U-M3F product photo

Nexis, NXT, 1 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), FEP encapsulated fluorocarbon elastomer (O-rings)

Product ID: NXT110UM3F
Unit of Measure
1/EA
Min Order Qty
1
Micron
1 micron
NXT 200-10U-M8F product photo

Nexis, NXT, 200 μm, 25.4 cm (10 in), SOE fin end, external 222 O-rings (retrofits other manufacturers’ Code 5), FEP encapsulated fluorocarbon elastomer (O-rings)

Product ID: NXT20010UM8F
Unit of Measure
1/EA
Min Order Qty
1
Micron
200 micron
NXT 30-10U-DOEE product photo

Nexis, NXT, 30 μm, 25.4 cm (10 in), DOE with elastomer gasket seals and end caps, EPDM gasket

Product ID: NXT3010UDOEE
Unit of Measure
1/EA
Min Order Qty
1
Micron
30 micron
NXT 30-10U-M3E product photo

Nexis, NXT, 30 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXT3010UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
30 micron
32 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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