Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Industries

Microelectronics

Cartridge Length (Imperial)

20 in

NXT 0.5-20U product photo

Nexis, NXT, 0.5 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT0520U
Unit of Measure
1/pkg
Min Order Qty
1
Micron
0.5 micron
NXT 1-20U-DOEN product photo

Nexis, NXT, 1 μm, 50.8 cm (20 in), DOE with elastomer gasket seals and end caps, Nitrile gasket

Product ID: NXT120UDOEN
Unit of Measure
1/EA
Min Order Qty
1
Micron
1 micron
NXT 150-20U product photo

Nexis, NXT, 150 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT15020U
Unit of Measure
1/EA
Min Order Qty
1
Micron
150 micron
NXT 15-20U product photo

Nexis, NXT, 15 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT1520U
Unit of Measure
1/EA
Min Order Qty
1
Micron
15 micron
NXT 200-20U-H21 product photo

Nexis, NXT, 200 μm, 50.8 cm (20 in), DOE, Santoprene gasket seal

Product ID: NXT20020UH21
Unit of Measure
1/EA
Min Order Qty
1
Micron
200 micron

Nexis® T Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 20 inches, EPDM, DOE with elastomer gasket seals and end caps

Product ID: NXT320UDOEE
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
3 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
EPDM
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Nexis® T Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 20 inches, DOE Santoprene gasket seal

Product ID: NXT320UH21
Unit of Measure
20/EA
Min Order Qty
20
Removal Rating
3 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
NA
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NXT 40-20U-M7E product photo

Nexis, NXT, 40 μm, 50.8 cm (20 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXT4020UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
40 micron

Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 20 inches, DOE Santoprene gasket seal

Product ID: CLR120H21
Unit of Measure
24/EA
Min Order Qty
24
Removal Rating
1 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
NA
See All Attributes

Profile® II, Filter Cartridges, Polypropylene, Length 20 Inches

Product ID: RM2F003H21
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
0.5 µm
Membrane Material
Polypropylene
Filter Cartridge Style
RMF-style
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
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Profile® Star Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 20 inches

Product ID: AB2A0107J
Unit of Measure
6/EA
Min Order Qty
6
Removal Rating
1 µm
Membrane Material
Polypropylene
Filter Cartridge Style
Code 7
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
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This product is currently not available. Please contact us for more information.

Profile® Star Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 20 inches, Ethylene Propylene, double O-ring with flat end

Product ID: AB2A0103J
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
1 µm
Membrane Material
Polypropylene
Filter Cartridge Style
Code 3
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
See All Attributes

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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