Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Microelectronics

Gasket / O-Ring Material

NA

Filter Media

Polypropylene

Claris® Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 9.875 inches

Product ID: CLR109875
Unit of Measure
72/EA
Min Order Qty
72
Removal Rating
10 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
9.875 in
Cartridge Length (Metric)
251 mm
Cartridge Length (Metric)
25.1 cm
Gasket / O-Ring Material
NA
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Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 20 inches, DOE Santoprene gasket seal

Product ID: CLR120H21
Unit of Measure
24/EA
Min Order Qty
24
Removal Rating
1 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
NA
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Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 40 inches product photo

Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 40 inches

Product ID: CLR140
Unit of Measure
12/EA
Min Order Qty
12
Length
102 cm / 40 in
Micron
1 micron

Claris® Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 10 inches

Product ID: CLR310
Unit of Measure
36/EA
Min Order Qty
36
Removal Rating
3 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
Gasket / O-Ring Material
NA
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NXT 0.5-20U product photo

Nexis, NXT, 0.5 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT0520U
Unit of Measure
1/pkg
Min Order Qty
1
Micron
0.5 micron

Nexis® T Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 10 inches, DOE Santoprene gasket seal

Product ID: NXT1010UH21
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
10 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
Gasket / O-Ring Material
NA
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NXT 1-4U product photo

Nexis, NXT, 1 μm, 10.2 cm (4 in), DOE industrial (no end caps)

Product ID: NXT14U
Unit of Measure
1/EA
Min Order Qty
1
Micron
1 micron
NXT 150-20U product photo

Nexis, NXT, 150 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT15020U
Unit of Measure
1/EA
Min Order Qty
1
Micron
150 micron
NXT 150-9.75U-H21 product photo

Nexis, NXT, 150 μm, 24.8 cm (9.75 in), DOE, Santoprene gasket seal

Product ID: NXT150975UH21
Unit of Measure
1/EA
Min Order Qty
1
Micron
150 micron
NXT 15-20U product photo

Nexis, NXT, 15 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT1520U
Unit of Measure
1/EA
Min Order Qty
1
Micron
15 micron
NXT 200-20U-H21 product photo

Nexis, NXT, 200 μm, 50.8 cm (20 in), DOE, Santoprene gasket seal

Product ID: NXT20020UH21
Unit of Measure
1/EA
Min Order Qty
1
Micron
200 micron

Nexis® T Filter Cartridges, Removal Rating 20 μm, Polypropylene, Length 29.25 inches

Product ID: NXT202925U
Unit of Measure
20/EA
Min Order Qty
20
Removal Rating
20 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
29.25 in
Cartridge Length (Metric)
743 mm
Cartridge Length (Metric)
74.3 cm
Gasket / O-Ring Material
NA
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17 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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