Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Microelectronics

Gasket / O-Ring Material

EPDM

Nexis® T Filter Cartridges, Removal Rating 200 μm, Polypropylene, EPDM, DOE with elastomer gasket seals and end caps

Product ID: NXT200TFUDOEE47
Unit of Measure
5/EA
Min Order Qty
5
Removal Rating
200 µm
Membrane Material
Polypropylene
Gasket / O-Ring Material
EPDM
End Configuration Code
DOE
End Configuration
DOE - DOE with elastomer gasket seals and end caps
Cartridge Type
NXT
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Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 30 inches, EPDM

Product ID: CLR130M7E
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
1 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket / O-Ring Material
EPDM
See All Attributes
NXA 0.5-10U-M3E product photo

Nexis, NXA, 0.5 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA0510UM3E
Unit of Measure
60/EA
Min Order Qty
60
Micron
0.5 micron
NXA 0.5-10U-DOEE product photo

Nexis, NXA, 0.5 μm, 25.4 cm (10 in), DOE with elastomer gasket seals and end caps, EPDM gasket

Product ID: NXA0510UDOEE
Unit of Measure
30/EA
Min Order Qty
30
Micron
0.5 micron
NXA 0.5-20U-M3E product photo

Nexis, NXA, 0.5 μm, 50.8 cm (20 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA0520UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
NXA 0.5-30U-M3E product photo

Nexis, NXA, 0.5 μm, 76.2 cm (30 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA0530UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
NXA 0.5-20U-DOEE product photo

Nexis, NXA, 0.5 μm, 50.8 cm (20 in), DOE with elastomer gasket seals and end caps, EPDM gasket

Product ID: NXA0520UDOEE
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
NXA 1-20U-M8E product photo

Nexis, NXA, 1 μm, 50.8 cm (20 in), SOE fin end, external 222 O-rings (retrofits other manufacturers’ Code 5), EPDM gasket

Product ID: NXA120UM8E
Unit of Measure
12/EA
Min Order Qty
12
Micron
1 micron
NXA 1-30U-DOEE product photo

Nexis, NXA, 1 μm, 76.2 cm (30 in), DOE with elastomer gasket seals and end caps, EPDM gasket

Product ID: NXA130UDOEE
Unit of Measure
24/EA
Min Order Qty
24
Micron
1 micron
NXA 120-10U-M7E product photo

Nexis, NXA, 120 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXA12010UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
120 micron
NXA 20-20U-M3E product photo

Nexis, NXA, 20 μm, 50.8 cm (20 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA2020UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
20 micron
NXA 20-4U-M3E product photo

Nexis, NXA, 20 μm, 10.2 cm (4 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA204UM3E
Unit of Measure
30/EA
Min Order Qty
30
Micron
20 micron
32 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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