Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Microelectronics

Availability

In Stock

Filter 10" Profile Star 1µm

Product ID: AB1A0103J
Unit of Measure
6/EA
Min Order Qty
6

Filter 10" Profile Star 5µm

Product ID: AB1A0503J
Unit of Measure
1/EA
Min Order Qty
1

AB1W00325J

Product ID: AB1W00325J
Unit of Measure
1/EA
Min Order Qty
1

AB1Y0503J

Product ID: AB1Y0503JTIMONIUM
Unit of Measure
1/EA
Min Order Qty
1

AB2P01019J

Product ID: AB2P01019JTIMONIUM
Unit of Measure
1/EA
Min Order Qty
1

AB2P10018J

Product ID: AB2P10018JTIMONIUM
Unit of Measure
1/EA
Min Order Qty
1

AB2P70018JDUP

Product ID: AB2P70018JDUPTIMMD
Unit of Measure
1/EA
Min Order Qty
1

AB2UUA7H4

Product ID: AB2UUA7H4
Unit of Measure
1/EA
Min Order Qty
1
C050A10U product photo

C050A10U

Product ID: C050A10U
Unit of Measure
30/EA
Min Order Qty
30
Packaging
Bulk
See All Attributes

Claris® Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 20 inches, DOE Santoprene gasket seal

Product ID: CLR120H21
Unit of Measure
24/EA
Min Order Qty
24
Removal Rating
1 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
NA
See All Attributes
Claris, Polypropylene, 50 micron, 29.25 inch product photo

Claris, Polypropylene, 50 micron, 29.25 inch

Product ID: CLR502925
Unit of Measure
12/EA
Min Order Qty
12
Length
74.3 cm / 29.25 in
Micron
50 micron
Claris, Polypropylene, 75 micron, 9.875 inch product photo

Claris, Polypropylene, 75 micron, 9.875 inch

Product ID: CLR759875
Unit of Measure
36/EA
Min Order Qty
36
Length
25.1 cm / 9.875 in
Micron
75 micron
38 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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