Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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RT250A10S

Product ID: RT250A10S
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1/EA
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10RPN20

Product ID: 10RPN20
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1/EA
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Discontinued

This part is no longer available. Please contact us for more information.
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3L1025W40A

Product ID: 3L1025W40A
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SUPRAdisc SD II EK 200XEK0C440SP

Product ID: 7007251
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SUPRAdisc SD II 50 200X050C440SP

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SUPRAdisc SD II 700 200X700C440SP

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SUPRAdisc SD II 150 200X150C440SP

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SM Kö 3-5 abgepackt in Säcken a 25kg

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AB1UY0207H4

Product ID: AB1UY0207H4
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Profile® Star Filter Cartridges, Removal Rating 5 μm, Polypropylene, Length 20 inches, Ethylene Propylene

Product ID: AB2A0507J
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
5 µm
Membrane Material
Polypropylene
Filter Cartridge Style
Code 7
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
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Profile® Star Filter Cartridges, Removal Rating 20 μm, Polypropylene, Length 20 inches, SiliconeElastomer

Product ID: AB2A2007WH4
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
20 µm
Membrane Material
Polypropylene
Industry-Specific Certification
W480 Food Contact
Filter Cartridge Style
Code 7
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
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AB2RT7H4

Product ID: AB2RT7H4
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Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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