Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Oil & Gas

Product Type

Housings, Vessels, and Assemblies

LMO10S-3/4HP product photo

LMO10S-3/4HP

Product ID: LMO10S34HP
Unit of Measure
1/EA
Min Order Qty
1
MDS4463GN8MFH1 product photo

MDS4463GN8MFH1

Product ID: MDS4463GN8MFH1
Unit of Measure
1/EA
Min Order Qty
1
IDL11GN12H product photo

IDL11GN12H

Product ID: IDL11GN12H
Unit of Measure
1/EA
Min Order Qty
1
HOUSING IDLD1GN12H product photo

HOUSING IDLD1GN12H

Product ID: IDLD1GN12H
Unit of Measure
1/EA
Min Order Qty
1
HOUSING IOL71GN16H1 product photo

HOUSING IOL71GN16H1

Product ID: IOL71GN16H1
Unit of Measure
1/EA
Min Order Qty
1
HOUSING IOL71GN16J product photo

Stainless steel, 10", 1" NPT, EPR seal for Code 7 cartridge

Product ID: IOL71GN16J
Unit of Measure
1/EA
Min Order Qty
1
UNIV SEAT CUP 1.75ID 316L product photo

UNIV SEAT CUP 1.75ID 316L

Product ID: T10575031
Unit of Measure
1/EA
Min Order Qty
1

Athalon, 400psi Duplex Hsg, 2.5in Flange Ports, 40in Length, Fluorocarbon Seals

Product ID: UR629CD4840ZA9
Unit of Measure
1/EA
Min Order Qty
1
Inlet/Outlet Connections Type
Imperial Flange (300 #)
Cartridge Length (Imperial)
40 in
Family
Athalon
Pressure Rating
400 psi
Port Size
2.5 in
Number of Cartridges
1
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8 Items
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Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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