Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Product Type

Accessories and Spare Parts

BT839

Product ID: BT839
Unit of Measure
1/EA
Min Order Qty
1

HC8420-A5V50CVR ASSEMBLY COVER

Product ID: HC8420-A5V50CVR
Unit of Measure
1/EA
Min Order Qty
1

MS3108A10SL-3S C

Product ID: MS3108A10SL3SC
Unit of Measure
1/EA
Min Order Qty
1

NC075AW40A

Product ID: NC075AW40A
Unit of Measure
10/EA
Min Order Qty
10

ORJP-222

Product ID: ORJP222
Unit of Measure
1/EA
Min Order Qty
1

P191889

Product ID: P191889
Unit of Measure
1/EA
Min Order Qty
1

OUTLET HOUSING ASSEMBLY

Product ID: P300121005101
Unit of Measure
1/EA
Min Order Qty
1

STUD

Product ID: P300121005602
Unit of Measure
1/EA
Min Order Qty
1

9640 VLV DRAIN VITON

Product ID: 9640VLVDRAINVITON
Unit of Measure
1/EA
Min Order Qty
1

9900 B VLV BP

Product ID: 9900BVLVBP
Unit of Measure
1/EA
Min Order Qty
1

SUPRApak™ L-Series Hook Spanner DN25-100 Tool

Product ID: ACS1037AA
Unit of Measure
1/EA
Min Order Qty
1

AS20016RT05.280

Product ID: AS20016RT05280
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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