Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Product Type

Filter Cartridges

RT250A10S product photo

RT250A10S

Product ID: RT250A10S
Unit of Measure
30/EA
Min Order Qty
30
Packaging
Bulk
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DFN 3-30AN-1X product photo

DFN 3-30AN-1X

Product ID: DFN330AN1X
Unit of Measure
12/EA
Min Order Qty
12

This product is currently not available. Please contact us for more information.

DFNE50040AV

Product ID: DFNE50040AV
Unit of Measure
12/EA
Min Order Qty
12

Duo-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Length 20 Inches, silicone, SOE fin end external 226 O-rings

Product ID: DFNT04520USM7
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
0.45 µm
End Configuration
SOE fin end, external 226 O-rings
Change Out Differential Pressure
2.4 bard

Duo-Fine® II, Filter Cartridges, Removal Rating 1 μm, Length 20 Inches, silicone, SOE fin end external 222 O-rings

Product ID: DFNT120USM8
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
1 µm
End Configuration
SOE fin end, external 222 O-rings
Change Out Differential Pressure
2.4 bard

DFNT 1-30UN-M7

Product ID: DFNT130UNM7
Unit of Measure
1/EA
Min Order Qty
1

Duo-Fine®, Filter Cartridges, Removal Rating 0.2 μm, Length 40 Inches

Product ID: DFPT0240UGTMG7
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
0.2 µm
Cartridge Length (Imperial)
40 in
Cartridge Length (Metric)
1016 mm
Cartridge Length (Metric)
101.6 cm
Change Out Differential Pressure
2.4 bard
Cartridge Outer Diameter (OD) (Imperial)
2.5 in
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DFPT 1-30EV-M3 product photo

DFPT 1-30EV-M3

Product ID: DFPT130EVM3
Unit of Measure
1/EA
Min Order Qty
1
E001AW30S product photo

E001AW30S

Product ID: E001AW30S
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
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E005AW20A-1PK

Product ID: E005AW20A1PK
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
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E010AW30S-EC1S

Product ID: E010AW30SEC1S
Unit of Measure
10/EA
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10
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Bulk
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E025AW30S-EC1S product photo

E025AW30S-EC1S

Product ID: E025AW30SEC1S
Unit of Measure
10/EA
Min Order Qty
10
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Bulk
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Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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