Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Product Type

Filter Cartridges

Product Use

Pre-Filtration

FEATURED

Emflon® PFRW Filter Cartridge, AB05PFR2WH4

Product ID: AB05PFR2WH4
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
0.2 µm
Membrane Material
Double Layer PTFE
Effective Filtration Area (Metric cm²)
4000 cm²
Filter Cartridge Style
Code 2
Cartridge Length (Imperial)
5 in
Cartridge Length (Metric)
127 mm
See All Attributes

Fuente II Filter Cartridge, AB1FFN7WH4

Product ID: AB1FFN7WH4
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
0.2 µm
Membrane Material
Double Layer PES, with built in pre-filtration
Effective Filtration Area (Metric m²)
1.04 m²
Filter Cartridge Style
Code 7
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
See All Attributes

Fluorodyne® II Filter Cartridges, AB1FSD7WH4

Product ID: AB1FSD7WH4
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
0.2 µm
Membrane Material
Hydrophilic polyvinylidene fluoride (PVDF)
Effective Filtration Area (Metric m²)
0.55 m²
Filter Cartridge Style
Code 7
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
See All Attributes
CLR 5-30-DOEE product photo

CLR 5-30-DOEE

Product ID: CLR530DOEE
Unit of Measure
12/EA
Min Order Qty
12

Claris® Filter Cartridge, CLR530W480

Product ID: CLR530W480
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
5 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket O-Ring Code
Blank
See All Attributes
FEATURED

Emflon® PFRW Junior Style Filter Cartridge, MCY4463PFRWH4

Product ID: MCY4463PFRWH4
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
0.2 µm
Membrane Material
Double Layer PTFE
Industry-Specific Certification
W480 Food Contact
Effective Filtration Area (Metric cm²)
2800 cm²
Filter Cartridge Style
MCY-style junior
Cartridge Length (Imperial)
5.3 in
See All Attributes
Nexis® A Series Filter Cartridges, Removal Rating 0.5 μm, Polypropylene, Length 10 inches, Nitrile product photo

Nexis® A Series Filter Cartridges, Removal Rating 0.5 μm, Polypropylene, Length 10 inches, Nitrile

Product ID: NXA0510UM3N
Unit of Measure
30/EA
Min Order Qty
30
Micron
0.5 micron
Nexis® A Series Filter Cartridges, Removal Rating 0.5 μm, Polypropylene, Length 10 inches, silicone product photo

Nexis® A Series Filter Cartridges, Removal Rating 0.5 μm, Polypropylene, Length 10 inches, silicone

Product ID: NXA0510UM3S
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
NXA 0.5-10U-M3E product photo

Nexis, NXA, 0.5 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA0510UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
Nexis® A Series Filter Cartridges, Removal Rating 0.5 μm, Polypropylene, Length 10 inches product photo

Nexis® A Series Filter Cartridges, Removal Rating 0.5 μm, Polypropylene, Length 10 inches

Product ID: NXA0510U
Unit of Measure
1/pkg
Min Order Qty
1
Micron
0.5 micron
NXA 0.5-20U-DOEE product photo

Nexis, NXA, 0.5 μm, 50.8 cm (20 in), DOE with elastomer gasket seals and end caps, EPDM gasket

Product ID: NXA0520UDOEE
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron

Discontinued

This part is no longer available. Please contact us for more information.
868 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

    Select Language :
    English