Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Filter Cartridges

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E005AW19.5U product photo

E005AW19.5U

Product ID: E005AW195U
Unit of Measure
10/EA
Min Order Qty
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E025AW19.5U product photo

E025AW19.5U

Product ID: E025AW195U
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10/EA
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10
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E010AW30S-EC1S product photo

E010AW30S-EC1S

Product ID: E010AW30SEC1S
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10/EA
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E025AW30S-EC1S product photo

E025AW30S-EC1S

Product ID: E025AW30SEC1S
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E050AW30S-EC1S product photo

E050AW30S-EC1S

Product ID: E050AW30SEC1S
Unit of Measure
10/EA
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E100AW30S product photo

E100AW30S

Product ID: E100AW30S
Unit of Measure
10/EA
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E125AW19.5U product photo

E125AW19.5U

Product ID: E125AW195U
Unit of Measure
10/EA
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10
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G F005AW30A-1PK product photo

G F005AW30A-1PK

Product ID: GF005AW30A1PK
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10/EA
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10
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G G005AW20A-1PK product photo

GG005AW20A1PK

Product ID: GG005AW20A1PK
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10/EA
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G G001AW20A-1PK product photo

G G001AW20A-1PK

Product ID: GG001AW20A1PK
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10/EA
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Claris® Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 30 inches product photo

Claris® Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 30 inches

Product ID: CLR1030
Unit of Measure
12/EA
Min Order Qty
12
Length
76.2 cm / 30 in
Micron
10 micron
Claris® Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 40 inches product photo

Claris® Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 40 inches

Product ID: CLR1040
Unit of Measure
12/EA
Min Order Qty
12
Length
102 cm / 40 in
Micron
10 micron
427 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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