Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Product Type

Housings, Vessels, and Assemblies

IDL11GN12H product photo

IDL11GN12H

Product ID: IDL11GN12H
Unit of Measure
1/EA
Min Order Qty
1
MDS4463GN8MFH1 product photo

MDS4463GN8MFH1

Product ID: MDS4463GN8MFH1
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1/EA
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UH310E24AN13ZC1YP52 ASSEMBLY FILTER product photo

UH310E24AN13ZC1YP52 ASSEMBLY FILTER

Product ID: 8FL51011
Unit of Measure
1/EA
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1

KIT ACS1050EA DN65 DIN 11851 GASKET

Product ID: ACS1050EA
Unit of Measure
1/EA
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1

Housing O-Ring Gen 2&3

Product ID: ACS1039EM
Unit of Measure
1/EA
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1

EWHF16G89ZZJ

Product ID: EWHF16G89ZZJ
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1/EA
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Stand for Single round FBT housings

Product ID: FBT01STAND
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1/EA
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1

WSFZ Standard Accessory Kit

Product ID: GFB0157
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1/EA
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Ultipor, 3000psi Non-bypass Simplex Hsg, 0.75in BSP Ports, 4in Length, Nitrile Seals

Product ID: HH9021C12RW1
Unit of Measure
1/EA
Min Order Qty
1
Inlet/Outlet Connections Type
BSP
Cartridge Length (Imperial)
4 in
Family
Ultipor
Pressure Rating
3000 psi
Port Size
0.75 in
Number of Cartridges
1
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HP8600B16TSSW0XYV1 ASSYFLTR VILTER 3007A product photo

HP8600B16TSSW0XYV1 ASSYFLTR VILTER 3007A

Product ID: HP8600B16TSSW0XYV1
Unit of Measure
1/EA
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1

Ultipor, 3000psi Non-bypass Simplex Hsg, 0.75in BSP Ports, 8in Length, Fluorocarbon Seals

Product ID: HZ9021C12SW1
Unit of Measure
1/EA
Min Order Qty
1
Inlet/Outlet Connections Type
BSP
Cartridge Length (Imperial)
8 in
Family
Ultipor
Pressure Rating
3000 psi
Port Size
0.75 in
Number of Cartridges
1
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118210151, Hardened Washer product photo

118210151, Hardened Washer

Product ID: 118210151
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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