Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Product Type

Housings, Vessels, and Assemblies

WSFZ Standard Accessory Kit

Product ID: GFB0157
Unit of Measure
1/EA
Min Order Qty
1

SUPRApak Adaptor for SDII 1-High

Product ID: SPMRTF21
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1/EA
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RETROFIT ADAPTOR SPM 2-HIGH TYPE 2

Product ID: SPMRTF22
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UNIV SEAT CUP 1.75ID 316L product photo

UNIV SEAT CUP 1.75ID 316L

Product ID: T10575031
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SEAL NUT PTM# P1175655 #MCL1001-4D22 product photo

SEAL NUT PTM# P1175655 #MCL1001-4D22

Product ID: T11078131
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EWHF16G89ZZJ

Product ID: EWHF16G89ZZJ
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Stand for Single round FBT housings

Product ID: FBT01STAND
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1/EA
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HP8600B16TSSW0XYV1 ASSYFLTR VILTER 3007A product photo

HP8600B16TSSW0XYV1 ASSYFLTR VILTER 3007A

Product ID: HP8600B16TSSW0XYV1
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Housing O-Ring Gen 2&3

Product ID: ACS1039EM
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1/EA
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KIT ACS1050EA DN65 DIN 11851 GASKET

Product ID: ACS1050EA
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SUPRAdisc™ 16-01 with Drain

Product ID: WSFZ161F31UT5J
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Athalon, 145psi Simplex Hsg, 1in SAE Ports, 8in Length, Fluorocarbon Seals

Product ID: UT210A1608ZB
Unit of Measure
1/EA
Min Order Qty
1
Inlet/Outlet Connections Type
SAE Straight Thread
Cartridge Length (Imperial)
8 in
Family
Athalon
Pressure Rating
145 psi
Port Size
1 in
Number of Cartridges
1
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Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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